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Novell EUV light sources for photolithography
conference contribution
posted on 2023-05-24, 11:22 authored by Ohnishi, M, Hugrass, W, Miyake, Y, Shimizu, T, Hanatani, KE, Osawa, HTwo novell devices to produce Extreme Ultra Violet (EUV) light for lithographic applications are being investigated at the Kansai Plasma Laboratory. The first is a Xe plasma produced discharge using 13.56 MHz rotating magnetic field. The second is a 2.45 GHz microwave plasma produced discharge. Both devices are debris-free and produce about 10 W EUV. The overall efficiency of these devices is 0.8 % and 3 %, respectively. Scaling of the experimental data from the first device shows increasing the input power brings about improvement in the efficiency such that the 100W EUV output needed for commercial applications can be generated for input power of about 3 kW.
History
Publication title
Proceedings 2012 International Workshop on EUV LithographyEditors
K RonsePagination
EJDepartment/School
School of Information and Communication TechnologyPublisher
EUV Litho, IncPlace of publication
HawaiiEvent title
2012 International Workshop on EUV LithographyEvent Venue
Maui, HawaiiDate of Event (Start Date)
2012-06-04Date of Event (End Date)
2012-06-08Repository Status
- Restricted