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Novell EUV light sources for photolithography

conference contribution
posted on 2023-05-24, 11:22 authored by Ohnishi, M, Hugrass, W, Miyake, Y, Shimizu, T, Hanatani, KE, Osawa, H
Two novell devices to produce Extreme Ultra Violet (EUV) light for lithographic applications are being investigated at the Kansai Plasma Laboratory. The first is a Xe plasma produced discharge using 13.56 MHz rotating magnetic field. The second is a 2.45 GHz microwave plasma produced discharge. Both devices are debris-free and produce about 10 W EUV. The overall efficiency of these devices is 0.8 % and 3 %, respectively. Scaling of the experimental data from the first device shows increasing the input power brings about improvement in the efficiency such that the 100W EUV output needed for commercial applications can be generated for input power of about 3 kW.

History

Publication title

Proceedings 2012 International Workshop on EUV Lithography

Editors

K Ronse

Pagination

EJ

Department/School

School of Information and Communication Technology

Publisher

EUV Litho, Inc

Place of publication

Hawaii

Event title

2012 International Workshop on EUV Lithography

Event Venue

Maui, Hawaii

Date of Event (Start Date)

2012-06-04

Date of Event (End Date)

2012-06-08

Repository Status

  • Restricted

Socio-economic Objectives

Integrated circuits and devices

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