An extreme ultraviolet source for photolithographic applications based on rotamak discharge

Xenon plasma produced in the Kansai Rotamak has been used to generate about 66W of extreme ultraviolet (EUV) radiation. The plasma in the Kansai Rotamak is produced using a rotating magnetic field (RMF) generated using a pair of 200 kHz/180kW oscillators. The plasma can be sustained for a period of 5ms limited only by the duration of applied RMF. The rotamak plasma discharge is electrodeless and its geometry is sufficiently simple to allow easy access to the emitted EUV radiation.