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Maskless photolithography using UV LEDs
journal contribution
posted on 2023-05-26, 15:24 authored by Rosanne Guijt, Breadmore, MCA UV light emitting diode (LED) with a maximum output of 372 nm was collimated using a pinhole and a small plastic tube and focused using a microscope objective onto a substrate for direct lithographic patterning of the photoresist. Movement of the substrate with a motorised linear stage (syringe pump) allowed lines in SU-8 to be pattered with a width down to 35 {micro}m at a linear velocity of 80 {micro}m s-1, while in the dry film resist Ordyl SY 330, features as narrow as 17 {micro}m were made at a linear velocity of 245 {micro}m s-1. At this linear velocity, a 75 mm long feature could be patterned in 5 min. Functional microfluidic devices were made by casting PDMS on a master made by LED lithography. The results show that UV LEDs are a suitable light source for direct writing lithography, offering a budget friendly, and high resolution alternative for rapid prototyping of features smaller than 20 {micro}m.
History
Publication title
Lab on a ChipVolume
8Article number
8Number
8Pagination
1402-1404ISSN
prit 1473-0197; olie 1473-0189Publication status
- Published
Rights statement
Copyright Royal Society of Chemistry 2008Repository Status
- Open